Tystar, diffusion, oxidation furnace system

Tystar low pressure CVD furnace system
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Outstanding performance, reduced manufacturing costs and improved
overall yields

TYTAN furnace systems offer a unique approach to the silicon wafer processing industry. Our patented heat-plug provides you with a much more compact furnace—without compromising throughput. This design results in superior process uniformity and higher-yield wafer production. Used in volume production environments as well as industry and university research laboratories, the TYTAN furnace comes in a variety of configurations and can handle wafers of up to 12"/300mm in diameter.

TYTAN provides these important benefits:

• A small footprint saves up to 40% of cleanroom space
• Superior process uniformity
• Outstanding throughput due to 95%+ up-time
• Processing of wafers up to 12"/300mm (see Tytan
  Furnace Configuration
for more detailed information.)
• Energy savings of up to 50% over competing designs

TYTAN furnaces are available in several sizes and configuration.

Click here for the Tytan Furnace Configuration Page.