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Carbon Nanotubes
Nano-Technology
Nano- Technolgy has become a multi-facetted field of interest for a variety of applications, such as solar cells, batteries, displays, optoelectronics, semiconductors and sensors. Carbon Nano Tubes (CNT) and Nano Wires are of interest for electronic and mechanical applications. Some of the new nanotechnology devices are still in the development stage; some have matured to the pre-production and production level.
Tystar Corporation introduces a family of equipment for the fabrication of Carbon Nano Tubes (CNT) and Nano Wires. The equipment is based on Tystar’s field proven TYTAN furnaces. The CNT equipment can be used for both CNT research and production applications. The CNT equipment is available for atmospheric and reduced pressure processes. The TYTAN Model 4000 1600 is a single tube furnace offering flexibility and it is primarily used for CNT research and development. The TYTAN Model 4600 is available for up to 4 tubes for CNT production with automated substrate loading/ unloading. All CNT systems include a quartz process chamber, gas and vapor control, low pressure and temperature control. All process steps from substrate loading to unloading are fully automated to ensure tight process control and reproducibility. The programmable process controller uses the same software as used for Tystar’s LPCVD process controls. It interfaces with the individual gas and temperature controllers and executes the pre-programmed recipe. A typical process sequence includes wafer loading, tube purge, temperature ramp-up and hydrogen reduction, CNT growth, cooling and unloading. CNT growth is typically carried out on catalyst coated wafers at temperatures of 750 – 800oC, using C2H4 and other hydrocarbons as feed gas. The reactor can process a batch of 50 substrates up to 6”/150 mm diameter. The Tystar large bore CNT reactor represents the fusion of the state-of-art technology based on proven equipment technology for semiconductor device fabrication. Tight process control is essential for the consistent, uniform growth of CNT films.1) The CNT 4600 system can be provided with a sliding furnace for fast heating and cooling. Compared to infrared heating systems on the market, the sliding furnace system quickly heats up the process gases and the substrates, resulting in better process control.
Optional items are:
- A sliding furnace for rapid sample heating
- A temperature controlled liquid precursor vaporizer
- All components for reduced pressure operation
- An electric field kit for directional growth
CNT arrays have found many promising applications, such as solar cells, thin film transistors, chemical sensors, flow sensors, electrical contacts and nano-electronic components. Growth of Single Wall and Multiwall Carbon Nano Tubes in the Tystar reactor has been reported. In addition, the reactors are used for growth of Silicon, ZnO and other types of Nanowires. Metal catalyzed, thermal CVD is the most widely used CNT growth technology and the only one with the potential to be scaled up for commercial quantities.
CNT fiber tensile strength of 3.3 GPa has been achieved. CNT growth rates of 70 μm have been observed. Wafers are stacked vertically in a quartz holder; CNT growth is perpendicular to the substrate surface.